COVER FIXING MEMBER AND COVER FIXING DEVICE OF INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A cover fixing hole and a cover fixing unit for an induced coupling plasma processing apparatus are provided to suppress the generation of particles by fixing a cover using a supporting unit and the cover sixing hole. CONSTITUTION: A high frequency antenna generates induced electric-field in a processing chamber. Supporting units support a window unit. A cover(12) covers the lower side of the window unit. The supporting units support a component to be supported(12A1) including a lower side(12A1a). The lower side of the component to be supported is a part of the cover. A component to be fixed(18A3) is fixed to the supporting unit. A cover fixing hole(18A) includes one or more supporting units and one component to be supported.