发明名称 STAGE APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD
摘要 <p>A stage apparatus includes a table member which holds a first object; a liquid recovery port which is provided on the table member and via which a first liquid is recovered; a first flow passage which is formed in the table member, which is connected to the liquid recovery port, and through which a second liquid flows to adjust a temperature of the table member; and a pressure-adjusting device which adjusts a pressure of the first flow passage. The stage apparatus is capable of suppressing the temperature change which would be otherwise caused by the heat of vaporization. An exposure apparatus including the stage apparatus is provided.</p>
申请公布号 KR20100107481(A) 申请公布日期 2010.10.05
申请号 KR20107016896 申请日期 2009.02.02
申请人 NIKON CORPORATION 发明人 NAGASAKA HIROYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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