| 发明名称 |
Method for doping impurities |
| 摘要 |
A method for doping impurities into a device layer includes providing a carbonized dopant layer including one or more dopant impurities over a device layer and heat treating the carbonized dopant layer to thermally diffuse the dopant impurities into the device layer.
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| 申请公布号 |
US7807556(B2) |
申请公布日期 |
2010.10.05 |
| 申请号 |
US20060566814 |
申请日期 |
2006.12.05 |
| 申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
DUNNE GREG THOMAS;TUCKER JESSE BERKLEY;SOLOVIEV STANISLAV IVANOVICH;STUM ZACHARY MATTHEW |
| 分类号 |
H01L21/22;H01L21/38 |
主分类号 |
H01L21/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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