| 摘要 |
PURPOSE: A selective etching liquid for gold and nickel is provided to treat a double laminate of gold and nickel with a single kind of liquid and to control the etching speed of gold and nickel. CONSTITUTION: A selective etching method for nickel and gold comprises steps of: controlling the blending ratio of components of an etching liquid containing iodide, iodine or acid/organic solvent in order that iodine is not extracted. The etching liquid used for a material containing gold and nickel together also contains one or more selected from the group of nitrogenous five-membered-ring compound, organosulfur compound, alcoholates, ketone compound, and amide compound.
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