发明名称 SUBSTRATES TREATING APPARATUS AND METHOD
摘要 PURPOSE: An apparatus and a method for processing substrates are provided to prevent the damage of substrates by verifying loads applied to a driving unit in order to perform a stable unloading process. CONSTITUTION: An electrostatic chuck(110) chucks substrates(W) using an electrostatic force generated from direct current power. A plurality of holes is arranged in the electrostatic chuck to a vertical direction. A plurality of lift pins(121) loads the substrates on the electrostatic chuck. The lift pins vertically move according to the holes. A plate(122) supports the lift pins. A driving unit(124) drives the plates in a vertical direction. A driving controller(125) controls the operation of the driving unit.
申请公布号 KR20100107221(A) 申请公布日期 2010.10.05
申请号 KR20090025396 申请日期 2009.03.25
申请人 PSK INC. 发明人 KIM, YONG SIK
分类号 H01L21/687;H01L21/68 主分类号 H01L21/687
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