发明名称 Surface depressions for die-to-die interconnects and associated systems and methods
摘要 Stacked microelectronic dies employing die-to-die interconnects and associated systems and methods are disclosed herein. In one embodiment, a stacked system of microelectronic dies includes a first microelectronic die, a second microelectronic die attached to the first die, and a die-to-die interconnect electrically coupling the first die with the second die. The first die includes a back-side surface, a surface depression in the back-side surface, and a first metal contact located within the surface depression. The second die includes a front-side surface and a second metal contact located at the front-side surface and aligned with the first metal contact of the first die. The die-to-die interconnect electrically couples the first metal contact of the first die with the second metal contact of the second die and includes a flowable metal layer that at least partially fills the surface depression of the first die.
申请公布号 US7800238(B2) 申请公布日期 2010.09.21
申请号 US20080147957 申请日期 2008.06.27
申请人 MICRON TECHNOLOGY, INC. 发明人 PRATT DAVID S.
分类号 H01L23/48;H01L23/52;H01L29/40 主分类号 H01L23/48
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