发明名称 Semiconductor device and method of manufacturing the same
摘要 Provided are a semiconductor device and a method of manufacturing the semiconductor device, for example, a semiconductor device using carbon nanotubes or nanowires as lower electrodes of a capacitor, and a method of manufacturing the semiconductor device. The semiconductor device may include a lower electrode including a plurality of tubes or wires on a semiconductor substrate, a dielectric layer on the surface of the lower electrode, and an upper electrode on the surface of the dielectric layer, wherein the plurality of tubes or wires radiate outwardly from each other centering on the lower portion of the plurality of tubes or wires. Thus, the off current of the capacitor may be increased by increasing the surface area of the lower electrodes of the capacitor.
申请公布号 US7799633(B2) 申请公布日期 2010.09.21
申请号 US20070980355 申请日期 2007.10.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI YOUNG-MOON;KIM JI-YOUNG;YEO IN-SEOK;LEE SUN-WOO
分类号 H01L21/8242;H01L27/108 主分类号 H01L21/8242
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