| 摘要 |
A method for manufacturing an indium tin oxide (ITO) target and methods for preparing indium oxide powder (In2O3) and tin oxide powder (SnO2). The method for manufacturing an ITO (indium tin oxide) target includes preparing an In2O3 powder having a surface area of about 10-18 m2/g and an average particle diameter of between about 40 to 80 nm; preparing a SnO2 powder having a surface area of about 8-15 m2/g and an average particle diameter of about 60-100 nm; molding a mixture of the In2O3 powder and the SnO2 powder; and sintering the mixture at atmospheric pressure under oxidation atmosphere. The ITO target is applicable for a high-quality, transparent electrode for a display, such as a liquid crystal display, electroluminescent display, or field emission display.
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