发明名称 SEMICONDUCTOR DEVICE WITH SCHOTTKY BARRIER DIODE, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which has a SBD structure capable of improving a surge withstand and reducing a resistance value in forward direction. SOLUTION: Forming an n-type impurity layer 6 along a side of a p<SP>+</SP>type impurity layer 3 makes an expanse of depletion layer extending from a side part of the p<SP>+</SP>type impurity layer 3 to a n<SP>-</SP>type drift layer 2 small. Therefore a width of the depletion layer formed at a PN junction narrows, and the resistance value in forward direction can be reduced. The area of the p+type impurity layer 3 per a unit area of a SiC semiconductor device can enlarge and both of improvement of surge withstand and reduction of resistance value can be achieved, because the resistance value in forward direction can be reduced. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010225878(A) 申请公布日期 2010.10.07
申请号 JP20090071828 申请日期 2009.03.24
申请人 DENSO CORP;TOYOTA MOTOR CORP 发明人 ENDO TAKESHI;YAMAMOTO TAKEO;KONISHI MASAKI;FUJIWARA HIROKAZU;KATSUNO TAKASHI;WATANABE YUKIHIKO
分类号 H01L29/47;H01L29/872 主分类号 H01L29/47
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