| 摘要 |
<P>PROBLEM TO BE SOLVED: To effectively adjust an electric field distribution in the vicinity of a slot antenna to form a uniform electric field distribution in the entire slot antenna by increasing electric field intensity immediately below a stub waveguide, in a slot antenna system microwave plasma processing device including a stub waveguide. <P>SOLUTION: This plasma processing device 100 includes stubs 43A as second waveguides for adjusting an electric field distribution formed on a planar antenna plate 31 constituting a flat waveguide. The stubs 43A are arranged on a conductive cover member 34. The stubs 43A are arranged to vertically superpose on slots 32 constituting a pair of slots arranged in the outermost circumference of the planar antenna plate 31. Annular grooves 28b are formed on the undersurface of a transmission plate 28 to vertically superpose on the stubs 43A. <P>COPYRIGHT: (C)2011,JPO&INPIT |
