发明名称 PROTECTIVE APPARATUS, MASK, MASK FORMING APPARATUS, MASK FORMING METHOD, EXPOSURE APPARATUS, DEVICE FABRICATING METHOD, AND FOREIGN MATTER DETECTION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a protective apparatus which suppresses torsion of a thin film portion. <P>SOLUTION: The protective apparatus protects a predetermined area of a surface of a substrate. The protective apparatus includes: a frame portion which includes a pair of flexible portions facing each other arranged along a first direction, and is connected to the surface of the substrate to enclose the circumference of the predetermined area; and a thin film portion which is stretched over the frame portion to face the surface of the substrate and blocks an opening formed by the frame portion. The flexible portions includes an end surface on the thin film side having a curved shape concaved toward the connected side with the substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010262284(A) 申请公布日期 2010.11.18
申请号 JP20100101341 申请日期 2010.04.26
申请人 NIKON CORP 发明人 HANAZAKI TETSUTSUGU
分类号 G03F1/14;B65D85/86;H01L21/027 主分类号 G03F1/14
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