WAFER DRYER AND METHOD FOR WAFER DRY METHOD USING THE SAME

摘要

PURPOSE: A wafer drying apparatus and a wafer drying method thereof are provided to reduce the used amount of gas by efficiently spraying the IPA nitride mixed gas. CONSTITUTION: A first rotary shaft(102) and a second rotary shaft(106) are formed on a side and the top of a chamber. A first drainage hole(107) is formed on the bottom of the chamber. A tilt arm(101) is connected to the first rotary shaft and the second rotary shaft. A screw(105) revolves by a drive motor(100) at the clockwise direction or the counter clock-wise.