BLANKMASK AND PHOTOMASK MANUFACTURED BY USING THE SAME

摘要

PURPOSE: A blank mask is provided to reduce loading effect by etching radical ion concentration. CONSTITUTION: A blank mask comprise: a metal film formed on a transparent substrate(10); and a hard mask(40) and resist film(50) formed on the upper portion of the metal film. The metal film comprises a single layer or multilayer. The thickness of the light-shielding layer is 100-500 angstrom.