发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <p>PURPOSE: A substrate processing apparatus is provided to implement the treatment process of a substrate using one load lock chamber even if a problem occur in one of two load lock chambers. CONSTITUTION: A cassette module(10) loads and unloads the cassette on which a plurality of substrates is mounted. The loadlock chambers(30, 40) comprises a pair of loaders arranged in horizontal direction with space from each other. A atmosphere transport module(20) transfers the substrate between the cassette module and the loadlock chamber. A plurality of process modules(60) processes the substrate.</p>
申请公布号 KR20110016642(A) 申请公布日期 2011.02.18
申请号 KR20090074250 申请日期 2009.08.12
申请人 ATTO CO., LTD. 发明人 KO, DONG SUN;KIM, YOUNG HYO
分类号 H01L21/677;H01L21/673 主分类号 H01L21/677
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