发明名称 METHOD FOR CHAMFERING BRITTLE MATERIAL SUBSTRATE
摘要 <p>[Summary] [Issue] A chamfering method is provided that can be conducted even in small worksite space without using grinding members and without requiring a cleaning process after a chamfering process. [Resolution Means] A brittle material substrate chamfering method according to the present invention includes steps of drawing a scribing line, and heating and/or cooling a part in proximity to the scribing line. The scribing line is drawn on a part of a surface of a brittle material substrate that extends along the edge of the brittle material substrate and has a width not more than 50% of the thickness of the brittle material substrate starting from the edge of the brittle material substrate whereby forming a crack inclined from the surface of the substrate toward a side end surface of the substrate. A part in proximity to the scribing line is heated and/or cooled so that a corner part of the edge of said brittle material substrate is cut out whereby chamfering said brittle material substrate. In the step of drawing a scribing line on the part of a surface of a brittle material substrate, a cutter wheel is preferably used that has a plurality of inclined grooves along the circumferential edge line as cutting edge. The inclined grooves are inclined at a predetermined angle relative to the axial direction of the cutter wheel.</p>
申请公布号 KR20110016927(A) 申请公布日期 2011.02.18
申请号 KR20107027715 申请日期 2009.04.27
申请人 MITSUBOSHI DIAMOND INDUSTRIAL CO., LTD. 发明人 MAEKAWA KAZUYA;SAKAGUCHI RYOTA;NAKAGAKI TOMOKI
分类号 C03B33/02;B24B9/10;C03B33/023;C03B33/033 主分类号 C03B33/02
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