发明名称 |
METHOD FOR CHAMFERING BRITTLE MATERIAL SUBSTRATE |
摘要 |
<p>[Summary] [Issue] A chamfering method is provided that can be conducted even in small worksite space without using grinding members and without requiring a cleaning process after a chamfering process. [Resolution Means] A brittle material substrate chamfering method according to the present invention includes steps of drawing a scribing line, and heating and/or cooling a part in proximity to the scribing line. The scribing line is drawn on a part of a surface of a brittle material substrate that extends along the edge of the brittle material substrate and has a width not more than 50% of the thickness of the brittle material substrate starting from the edge of the brittle material substrate whereby forming a crack inclined from the surface of the substrate toward a side end surface of the substrate. A part in proximity to the scribing line is heated and/or cooled so that a corner part of the edge of said brittle material substrate is cut out whereby chamfering said brittle material substrate. In the step of drawing a scribing line on the part of a surface of a brittle material substrate, a cutter wheel is preferably used that has a plurality of inclined grooves along the circumferential edge line as cutting edge. The inclined grooves are inclined at a predetermined angle relative to the axial direction of the cutter wheel.</p> |
申请公布号 |
KR20110016927(A) |
申请公布日期 |
2011.02.18 |
申请号 |
KR20107027715 |
申请日期 |
2009.04.27 |
申请人 |
MITSUBOSHI DIAMOND INDUSTRIAL CO., LTD. |
发明人 |
MAEKAWA KAZUYA;SAKAGUCHI RYOTA;NAKAGAKI TOMOKI |
分类号 |
C03B33/02;B24B9/10;C03B33/023;C03B33/033 |
主分类号 |
C03B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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