| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a detection apparatus which detects an upper-surface mark and lower-surface mark formed on an upper surface and lower surface of a substrate. <P>SOLUTION: The detection apparatus which detects the upper-surface mark and lower-surface mark formed on the upper surface and lower surface, respectively, of the substrate to which a pattern of a reticle is transferred includes a light source to emit first light with a wavelength which is transmitted through the substrate and second light with a wavelength which is not transmitted through the substrate, a photoelectric conversion device, and an optical system configured to form an image of the lower-surface mark on a light-receiving surface of the photoelectric conversion device using the first light which is emitted by the light source, applied to the lower-surface mark from the upper surface of the substrate, and reflected by the lower-surface mark, and to form an image of the upper-surface mark on the light-receiving surface of the photoelectric conversion device using the second light which is emitted by the light source, applied to the upper-surface mark from the upper surface of the substrate, and reflected by the upper-surface mark. <P>COPYRIGHT: (C)2011,JPO&INPIT |
