| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning apparatus for controlling the amount of a cleaning solution during cleaning, and to provide a cleaning method. SOLUTION: The cleaning apparatus includes: a supply unit for supplying the cleaning solution to a predetermined part of an object to be cleaned; a vibrating body for vibrating the cleaning solution supplied to the object by coming into contact with the cleaning solution; a monitoring unit for monitoring an amount of the cleaning solution; and a control unit for controlling the supply unit to supply an additional cleaning solution to the cleaning solution when detecting reduction in the cleaning solution based on results of the control unit. COPYRIGHT: (C)2011,JPO&INPIT
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