发明名称 |
METHOD OF MANUFACTURING ALN SINGLE CRYSTAL, AND ALN SINGLE CRYSTAL SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an AlN single crystal capable of suppressing quality deterioration due to sublimation of a SiC substrate, and a AlN single crystal substrate formed by the method of manufacturing. SOLUTION: The method of manufacturing an AlN single crystal (a nitride single crystal film 1) comprises: a process of preparing a SiC substrate (a base substrate 9); a process of preparing a (SiC)<SB>1-x</SB>(AlN)<SB>x</SB>powder (a raw material mixed powder 5) by mixing a SiC powder and an AlN powder; and a process of forming the nitride single crystal film 1 on one main surface of the base substrate 9 using the raw material mixed powder 5. In addition, SiC may be contained in the AlN single crystal (the nitride single crystal film 1). COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2011046587(A) |
申请公布日期 |
2011.03.10 |
申请号 |
JP20100141746 |
申请日期 |
2010.06.22 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
SATO KAZUNARI;YAMAMOTO YOSHIYUKI |
分类号 |
C30B29/38 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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地址 |
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