发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition from which a cured film superior in adhesion, electroless gold plating resistance, resolution, thermal shock resistance, electric insulation and solvent resistance is obtained, and to provide a cured product thereof. <P>SOLUTION: The photosensitive resin composition includes: (A) a polymer having a phenolic hydroxyl group; (B) a compound having two or more alkyl etherified amino groups per molecule; (C) a cyclic ether structure-containing compound; (D) a light-sensitive acid generator; and (E) a triazine structure-containing novolac resin. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011053670(A) 申请公布日期 2011.03.17
申请号 JP20100174667 申请日期 2010.08.03
申请人 JSR CORP 发明人 OKUDA RYUICHI;TAKAHASHI SEIICHIRO;HIRO AKIHITO;GOTO HIROFUMI
分类号 G03F7/038;G03F7/004;H01L21/027;H05K3/28 主分类号 G03F7/038
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