发明名称 LOW RADIATION FILM
摘要 PROBLEM TO BE SOLVED: To provide a low radiation film which can adjust a reflective color tone. SOLUTION: The low radiation film formed on a substrate by a vapor deposition process has a laminated structure where a dielectric layer and a metallic layer essentially consisting of Ag are laminated alternately by 2n+1 layer (n is an integer of≥1). The metallic layer is formed using a gaseous mixture composed of Ar and oxygen, and, regarding the gaseous mixture, the concentration of oxygen expressed by oxygen/(Ar+oxygen)×100 is 0.5 to 13 vol.%. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011052294(A) 申请公布日期 2011.03.17
申请号 JP20090203938 申请日期 2009.09.03
申请人 CENTRAL GLASS CO LTD 发明人 KATO KAZUHIRO;OMOTO HIDEO
分类号 C23C14/06;C03C17/36;C23C14/14;C23C14/34 主分类号 C23C14/06
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