发明名称 PLANARIZATION OVER TOPOGRAPHY WITH MOLECULAR GLASS MATERIALS
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of flattening on a topography using molecular glass materials. <P>SOLUTION: A flattened composition using molecular glass as a base for lithographic processing is disclosed. A process generally includes the steps of casting a planarizing composition containing at least one molecular glass and at least one solvent on a surface containing a lithographic structure and heating the flattened composition to a temperature higher than the glass transition temperature of at least one molecular glass. Exemplary molecular glass includes a polyhedral oligomeric silsesquioxane derivative, calixarene, a cyclodextrin derivative, and the other non-polymer macromolecules. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011082510(A) 申请公布日期 2011.04.21
申请号 JP20100211611 申请日期 2010.09.22
申请人 INTERNATL BUSINESS MACH CORP 发明人 SOORIYAKUMARAN RATNAM;HART MARK WHITNEY;ALLEN ROBERT DAVID
分类号 H01L21/027;C08G77/38;C08L83/04 主分类号 H01L21/027
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