发明名称 |
PLANARIZATION OVER TOPOGRAPHY WITH MOLECULAR GLASS MATERIALS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of flattening on a topography using molecular glass materials. <P>SOLUTION: A flattened composition using molecular glass as a base for lithographic processing is disclosed. A process generally includes the steps of casting a planarizing composition containing at least one molecular glass and at least one solvent on a surface containing a lithographic structure and heating the flattened composition to a temperature higher than the glass transition temperature of at least one molecular glass. Exemplary molecular glass includes a polyhedral oligomeric silsesquioxane derivative, calixarene, a cyclodextrin derivative, and the other non-polymer macromolecules. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011082510(A) |
申请公布日期 |
2011.04.21 |
申请号 |
JP20100211611 |
申请日期 |
2010.09.22 |
申请人 |
INTERNATL BUSINESS MACH CORP |
发明人 |
SOORIYAKUMARAN RATNAM;HART MARK WHITNEY;ALLEN ROBERT DAVID |
分类号 |
H01L21/027;C08G77/38;C08L83/04 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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