| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent occurrence of underexposure and double exposure near a boundary of an exposure region when a part of light radiated to a mask is blocked to restrict the exposure region in the exposure of a substrate using a proximity system. <P>SOLUTION: Plate shutters 10 and 20 are disposed separately from the mask 4, and belt-like shutters 30a, 30b, 40a and 40b are disposed close to the mask 4. When the exposure region is restricted, the XY direction of the plate shutters 10 and 20 and the belt-like shutters 30a, 30b, 40a and 40b is moved to a predetermined position. The plate shutters 10 and 20 block large part of the light radiated to the region other than the exposure region of the mask 4, and belt-like shutters 30a, 30b, 40a and 40b block the light radiated to the proximity of the boundary of the exposure region of the mask 4. Light that passes ends of the plate shutters 10 and 20 and spreads by diffraction is blocked by the belt-like shutters 30a, 30b, 40a and 40b. <P>COPYRIGHT: (C)2011,JPO&INPIT |
