发明名称 PLASMA TREATMENT DEVICE
摘要 FIELD: physics. ^ SUBSTANCE: plasma treatment device has electrodes, electric discharge space and an electric power supply. The electrodes are formed by embedding a conductive layer in an insulating substrate made of a ceramic sintered body. The electric discharge space is formed between oppositely lying electrodes. The electric power supply triggers an electric discharge by applying voltage to the conductive layers. The insulating substrate of each electrode has connection parts on both ends. The connection parts protrude from the insulating substrate and are connected to each other so as to cover the open parts of corresponding sides of the electric discharge space. ^ EFFECT: high efficiency of plasma ejection. ^ 9 cl, 9 dwg
申请公布号 RU2420044(C2) 申请公布日期 2011.05.27
申请号 RU20090131534 申请日期 2008.02.13
申请人 PANASONIK EHLEKTRIK VORKS KO., LTD. 发明人 SIBATA TETSUDZI;TAGUTI NORIJUKI;NAKAZONO JOSIJUKI
分类号 H05H1/24 主分类号 H05H1/24
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