发明名称 Lithographic apparatus, radiation sensor and method of manufacturing a radiation sensor
摘要 A radiation sensor includes a radiation receiver positioned in a focal plane of the final element of the projection system; a transmissive plate supporting the radiation receiver at a side facing the projection system; a quantum conversion layer to absorb light at the first wavelength incident on the transmissive plate and reradiate light at a second wavelength; a fiber optics block with a plurality of optical fibers; and a radiation detector. In the radiation sensor, the plurality of optical fibers guide light is reradiated by the quantum conversion layer towards the radiation detector. The radiation sensor can be used as a substrate-level sensor in a lithographic apparatus.
申请公布号 US8013977(B2) 申请公布日期 2011.09.06
申请号 US20060487607 申请日期 2006.07.17
申请人 ASML NETHERLANDS B.V. 发明人 KOK HAICO VICTOR;VAN DER SIJS ARIE JOHAN
分类号 G03B27/42 主分类号 G03B27/42
代理机构 代理人
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