发明名称 |
SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To increase saturation current by reducing a channel length without lowering off-withstand voltage optimized by a trade-off relationship with on-resistance, in an LDMOS transistor. SOLUTION: A short channel region 12 having polarity reverse to that of a low-concentration body region 10 and high in concentration is selectively formed between the low-concentration body region 10 becoming a channel and an element isolation film 4 and immediately under a gate oxide film 8, and a shape where only a part immediately under the gate oxide film 8 of the body region 10 is retracted toward a high-concentration source region 7 is provided. COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011181709(A) |
申请公布日期 |
2011.09.15 |
申请号 |
JP20100044861 |
申请日期 |
2010.03.02 |
申请人 |
HITACHI LTD |
发明人 |
MIYAKOSHI KENJI;WADA SHINICHIRO;YANAGIDA YOHEI;OSHIMA TAKAFUMI;KITAZAWA KEIGO |
分类号 |
H01L29/786;H01L21/8234;H01L27/088;H01L29/78 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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