发明名称 SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To increase saturation current by reducing a channel length without lowering off-withstand voltage optimized by a trade-off relationship with on-resistance, in an LDMOS transistor. SOLUTION: A short channel region 12 having polarity reverse to that of a low-concentration body region 10 and high in concentration is selectively formed between the low-concentration body region 10 becoming a channel and an element isolation film 4 and immediately under a gate oxide film 8, and a shape where only a part immediately under the gate oxide film 8 of the body region 10 is retracted toward a high-concentration source region 7 is provided. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011181709(A) 申请公布日期 2011.09.15
申请号 JP20100044861 申请日期 2010.03.02
申请人 HITACHI LTD 发明人 MIYAKOSHI KENJI;WADA SHINICHIRO;YANAGIDA YOHEI;OSHIMA TAKAFUMI;KITAZAWA KEIGO
分类号 H01L29/786;H01L21/8234;H01L27/088;H01L29/78 主分类号 H01L29/786
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