发明名称 |
SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, PROGRAM AND COMPUTER STORAGE MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device which smoothly and suitably processes a substrate.SOLUTION: A processing container 10 of a bonding device 1 is configured in such a way that an upper container 11 positioned on an upper side and a lower container 12 positioned on a lower side are connected to each other by a shield bellow 13. A processing space K for bonding processing on a wafer W is formed between the upper container 11 and lower container 12. A heat treatment plate 20 is provided in the lower container 12, and a cut groove 21 capable of accommodating a delivery member 42 is formed in an outer peripheral part of the heat treatment plate 20. The upper container 11 is provided with: a support member 41 which extends perpendicularly downward from an under surface of the upper container 11; a delivery member 42 which holds the outer peripheral part of the wafer W and delivers the wafer W to and receives it from the heat treatment plate 20; and a connection part for connecting the support member 41 and delivery member 42 to each other. The delivery arm 40 freely moves in a perpendicular direction together with the upper container 11. |
申请公布号 |
JP2011199139(A) |
申请公布日期 |
2011.10.06 |
申请号 |
JP20100066276 |
申请日期 |
2010.03.23 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
HIRAKAWA OSAMU |
分类号 |
H01L21/677;H01L21/027;H01L21/683 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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