| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film forming device capable of uniformly forming a thin film, compared to a conventional thin-film forming device.SOLUTION: The thin-film forming device includes a film-forming container to which a material gas and a reaction gas are supplied in alternation at different timings, and which forms a reduced pressure film-forming space for forming a thin film on a substrate; and a gas supply unit which supplies the material gas and the reaction gas to the film-forming container. The gas supply unit is provided with at least one screen plate for bending the gas flow path by which the material gas and the reaction gas flow from an inlet towards the film-forming space. |
