| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoacid generator showing extremely high sensitivity to light of near-ultraviolet range of around 300-400 nm, thereby achieving highly increased reaction rate, and a photoreactive composition requiring extremely short reaction time under exposure to near-ultraviolet irradiation.SOLUTION: A benzo[b]thiophene sulfonium salt compound represented by formula (1) (wherein R-Reach independently represents hydrogen atom, halogen atom, 1C-4C alkyl halide group, 1C-10C alkyl group, 1C-4C alkoxy group, 1C-8C acyl group or hydroxy group; and X represents anion) is provided. |
