发明名称 Piezoelectric Gate-Induced Strain
摘要 An embodiment is a semiconductor device. The semiconductor device comprises a substrate, an electrode over the substrate, and a piezoelectric layer disposed between the substrate and the electrode. The piezoelectric layer causes a strain in the substrate when an electric field is generated by the electrode.
申请公布号 US2011248322(A1) 申请公布日期 2011.10.13
申请号 US20100758568 申请日期 2010.04.12
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 WONG KING-YUEN;CHAN CHIEN-TAI;LIN DA-WEN;WU CHUNG-CHENG
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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