| 摘要 |
PROBLEM TO BE SOLVED: To improve sample production efficiency by eliminating as much moisture as possible remaining in a gas in the load lock chamber by introducing a dry nitrogen gas when carrying the sample between the load lock chamber of a semiconductor processing apparatus and an atmospheric carry-in/out means since reduction of foreign objects with a minute particle diameter is called for that are produced from a semiconductor manufacturing apparatus in association with miniaturization of the semiconductor elements, substantially controlling condensed water produced by temperature change of the gas at the time of pressure reduction and evacuation, and reducing faulty patterns arising from foreign objects adherent to the sample by the dripping of the condensed water.SOLUTION: For the sample carry-in/out operation between a load lock chamber 9a and an atmospheric carry-in/out means, a dry nitrogen gas is introduced and humidity in the load lock chamber 9a is reduced, and the gas introduction member 40, made up of a porous material when introducing the dry nitrogen gas, is set up on the top surface of the load lock chamber lid 21 that faces the sample table 14a. |
