| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition resin which can form resist patterns having excellent line edge roughness. <P>SOLUTION: There is provided a resin obtained by reacting a polyhydric phenol with a compound represented by formula (1) [wherein, R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>are each independently H or methyl; A<SP POS="POST">1</SP>is a divalent 1 to 20C saturated hydrocarbon group; and A<SP POS="POST">1</SP>is preferably a divalent 1 to 10C saturated hydrocarbon group]. The polyhydric phenol is preferably at least one selected from the group consisting of a compound represented by formula (2) (not shown), a compound represented by formula (4) (not shown), a compound represented by formula (5) (not shown), a compound represented by formula (6) (not shown), and a compound represented by formula (7) (not shown). <P>COPYRIGHT: (C)2012,JPO&INPIT |
