METAL-ORGANIC CHEMICAL VAPOR DEPOSITION APPARATUS

摘要

PURPOSE: A metal organic chemical vapor deposition apparatus is provided to efficiently use the space of a wafer loading board by arranging the various sizes of wafer load sections in the wafer loading board. CONSTITUTION: A reaction chamber includes one opening. A rotation support is arranged in the reaction chamber. A wafer loading board(232) includes seven large wafer loading sections(234) on a surface(238). The wafer loading board includes six small wafer loading sections(236) around large wafer loading sections. A gas spraying head sprays a reaction gas to the surface of the wafer loading board.