发明名称 BASE SUBSTRATE WITH TRANSPARENT CONDUCTIVE OXIDE FILM AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a base substrate with a transparent conductive oxide film which has low resistance, high transparency, excellent light scattering performance over the entire wavelength range of sunlight, and especially, has sufficiently small variance in C-light-source haze ratio even when used for a transfer type CVD device; a method for producing the base substrate; and a photoelectric conversion element using the base substrate. <P>SOLUTION: A base substrate with a transparent conductive oxide film, which is the base substrate provided with a transparent conductive oxide film on a base. The film is constituted by a plurality of mountainous portions 12 and a plurality of flat portions 13, with the surfaces of the mountainous portions 12 and flat portions 13 having a large number of continuous micro protrusions. The base substrate has: a spectral haze ratio of 10-95% over the entire wavelength range of 400-800 nm, with the difference (maximum-minimum) between a maximum and a minimum of the spectral haze ratio being equal to or less than 50%; the C-light-source haze ratio of 30-90% and the difference (maximum-minimum) between a maximum and a minimum of the C-light-source haze ratio being equal to or less than 20% when the C-light-source haze ratio is measured by a haze meter for over the entire surface of the base substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011223023(A) 申请公布日期 2011.11.04
申请号 JP20110144321 申请日期 2011.06.29
申请人 ASAHI GLASS CO LTD 发明人 SATO KAZUO;TANEDA NAOKI;FUKAWA MAKOTO
分类号 H01L31/04 主分类号 H01L31/04
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