发明名称 SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a structure capable of both reducing turn-on voltage and realizing high withstand voltage. <P>SOLUTION: An SiC vertical diode comprises a cathode electrode 21, an n<SP POS="POST">++</SP>cathode layer 10, an n<SP POS="POST">-</SP>drift layer 11 on the n<SP POS="POST">++</SP>cathode layer, a pair of p<SP POS="POST">+</SP>regions 12, an n<SP POS="POST">+</SP>channel region 16 formed between the n<SP POS="POST">-</SP>drift layer 11 and the p<SP POS="POST">+</SP>regions 12 and sandwiched between a pair of the p<SP POS="POST">+</SP>regions 12, an n<SP POS="POST">++</SP>anode region 14, and an anode electrode 22 formed on the n<SP POS="POST">++</SP>anode region 14 and the p<SP POS="POST">+</SP>regions 12. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011222681(A) 申请公布日期 2011.11.04
申请号 JP20100089132 申请日期 2010.04.08
申请人 HITACHI LTD 发明人 ONOSE HIDEKATSU
分类号 H01L29/861;H01L21/331;H01L21/336;H01L21/337;H01L21/8222;H01L21/8234;H01L27/04;H01L27/06;H01L27/088;H01L29/12;H01L29/732;H01L29/78;H01L29/80;H01L29/808 主分类号 H01L29/861
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