发明名称 |
SUBSTRATE LAMINATING DEVICE, METHOD FOR MANUFACTURING LAMINATED SEMICONDUCTOR DEVICE, AND LAMINATED SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To improve throughput of a substrate laminating device. <P>SOLUTION: The substrate laminating device is for laminating a plurality of substrates and comprises: a temperature-raising unit to heat up superposed substrates made by laminating the plurality of substrates to a predetermined temperature; and a heat retaining unit to retain the temperature of the superposed substrates at a temperature at which a plurality of substrates of the superposed substrates which were heated up by the temperature-raising unit are thermally connected to each other. The heat retaining unit has a pressing unit to hold a plurality of the superposed substrates in tandem in between and press them. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011222632(A) |
申请公布日期 |
2011.11.04 |
申请号 |
JP20100088116 |
申请日期 |
2010.04.06 |
申请人 |
NIKON CORP |
发明人 |
SUGAYA ISAO;KITO YOSHIAKI |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|