发明名称 SUBSTRATE LAMINATING DEVICE, METHOD FOR MANUFACTURING LAMINATED SEMICONDUCTOR DEVICE, AND LAMINATED SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To improve throughput of a substrate laminating device. <P>SOLUTION: The substrate laminating device is for laminating a plurality of substrates and comprises: a temperature-raising unit to heat up superposed substrates made by laminating the plurality of substrates to a predetermined temperature; and a heat retaining unit to retain the temperature of the superposed substrates at a temperature at which a plurality of substrates of the superposed substrates which were heated up by the temperature-raising unit are thermally connected to each other. The heat retaining unit has a pressing unit to hold a plurality of the superposed substrates in tandem in between and press them. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011222632(A) 申请公布日期 2011.11.04
申请号 JP20100088116 申请日期 2010.04.06
申请人 NIKON CORP 发明人 SUGAYA ISAO;KITO YOSHIAKI
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址