发明名称 Mechanical patterning of thin film photovoltaic materials and structure
摘要 A method for forming one or more patterns for a thin film photovoltaic material. The method includes providing a substrate including a molybdenum layer and an overlying absorber comprising a copper bearing species and a window layer comprising a cadmium bearing species. The substrate is supported to expose a surface of the window layer. In a specific embodiment, the method includes using a scribe device. The scribe device includes a scribe having a tip. The scribe device is configured to pivot about one or more regions and configured to apply pressure to the tip, such that the tip is placed on a selected region of the window layer or the absorber layer. The method moves the scribe device relative to the substrate in a direction to form a pattern on at least the window layer or the absorber layer at a determined speed maintaining the molybdenum layer free from the pattern.
申请公布号 US8082672(B2) 申请公布日期 2011.12.27
申请号 US20090577133 申请日期 2009.10.09
申请人 WIETING ROBERT D.;STION CORPORATION 发明人 WIETING ROBERT D.
分类号 B43L13/24;H01L21/8242 主分类号 B43L13/24
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