发明名称 LASER LIFT-OFF METHOD
摘要 <P>PROBLEM TO BE SOLVED: To exfoliate a material layer from a substrate without generating a crack in the material layer formed on the substrate. <P>SOLUTION: In order to exfoliate the material layer from the substrate in the interface of the substrate 1 and the material layer 2, to a work 3 in which the material layer 2 is formed on the substrate 1, through the substrate 1, a pulse laser light is irradiated so that adjacent each irradiation region is overlapped in the work 3, while changing the irradiation region to the work 3 every second. The irradiation region of the pulse laser light to the work is set so that when the area of the irradiation region is made to be S (mm<SP POS="POST">2</SP>), the circumference length of the irradiation region to be L (mm), the relation S/L&le;0.125 is satisfied. Thereby, it is possible to exfoliate securely the material layer from the substrate without generating a crack in the material layer formed on the substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012024783(A) 申请公布日期 2012.02.09
申请号 JP20100163273 申请日期 2010.07.20
申请人 USHIO INC 发明人 MATSUDA RYOZO;NARUMI KEIJI;TANAKA KAZUYA;SHINOYAMA KAZUKI;MATSUMOTO SHUNJI
分类号 B23K26/073;B23K26/00;B23K26/04;B23K26/40;H01L21/268 主分类号 B23K26/073
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