| 发明名称 |
Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device |
| 摘要 |
A polybenzoxazole precursor is represented by the following formula (1): wherein R1a to R4a, R1b to R4b, X1, Y1 and m are defined in the specification. |
| 申请公布号 |
US8133550(B2) |
申请公布日期 |
2012.03.13 |
| 申请号 |
US20070855302 |
申请日期 |
2007.09.14 |
| 申请人 |
SATO KENICHIRO;YAMANAKA TSUKASA;FUJIFILM CORPORATION |
发明人 |
SATO KENICHIRO;YAMANAKA TSUKASA |
| 分类号 |
C08J7/04;G03F7/00;G03F7/26 |
主分类号 |
C08J7/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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