| 摘要 |
<P>PROBLEM TO BE SOLVED: To measure a vapor deposition flux directed in an x direction perpendicular to a y direction by the atomic absorption method without causing a light source or optical receiver to be fouled by a film-forming material when forming a film by vapor deposition while carrying a substrate in the y direction. <P>SOLUTION: An apparatus for measuring a vapor deposition flux includes: first and second tubular units extended in the x direction and disposed by taking a distance to each other in the y direction, the units including a measuring light transmissive area extended in the x direction and separated from a film formation space by the vapor deposition on an airtight basis; and a light source moving device for moving the light source in the x direction in the first tubular units as well as an optical receiver moving device for moving the optical receiver in the x direction in synchronization with the movement of the light source in the second tubular units. <P>COPYRIGHT: (C)2012,JPO&INPIT |
