| 发明名称 |
METHOD FOR PRODUCTION OF INDIUM TARGET, AND INDIUM TARGET |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for production of an indium target capable of favorably inhibiting the occurrence of abnormal discharge when sputtering, and to provide the indium target. <P>SOLUTION: The method for production of the indium target includes a step of feeding an indium raw material from the lower portion of a mold to perform the fusion casting of the raw material. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012052176(A) |
申请公布日期 |
2012.03.15 |
| 申请号 |
JP20100194579 |
申请日期 |
2010.08.31 |
| 申请人 |
JX NIPPON MINING & METALS CORP |
发明人 |
MAEKAWA TAKAMASA;SAKAMOTO MASARU;KOSHO TAKASHI |
| 分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
| 代理机构 |
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代理人 |
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