发明名称 Structure of power grid for semiconductor devices and method of making the same
摘要 An embodiment of the invention provides a semiconductor structure, which may include a stud of a first conductive material formed inside a dielectric layer; a via of a second conductive material having a bottom and sidewalls with the bottom and the sidewalls being covered by a conductive liner, and the bottom being formed directly on top of the stud and being in contact with the via through the conductive liner; and one or more conductive paths of a third conductive material connecting to the via through the conductive liner at the sidewalls of said the. A method of making the semiconductor structure is also provided.
申请公布号 US8164190(B2) 申请公布日期 2012.04.24
申请号 US20090491372 申请日期 2009.06.25
申请人 FILIPPI RONALD;LI WAI-KIN;WANG PING-CHUAN;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FILIPPI RONALD;LI WAI-KIN;WANG PING-CHUAN
分类号 H01L23/48;H01L23/52;H01L29/40 主分类号 H01L23/48
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