| 发明名称 |
Method for constructing OPC model |
| 摘要 |
A method for constructing an optical proximity correction (OPC) model is described. A test pattern is provided, and the test pattern is then written on a mask. The pattern on the mask is measured to obtain a modified pattern. An OPC model is constructed according to the modified pattern. |
| 申请公布号 |
US8166424(B2) |
申请公布日期 |
2012.04.24 |
| 申请号 |
US20080211657 |
申请日期 |
2008.09.16 |
| 申请人 |
WU TE-HUNG;YANG CHUEN-HUEI;UNITED MICROELECTRONICS CORP. |
发明人 |
WU TE-HUNG;YANG CHUEN-HUEI |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
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代理人 |
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| 地址 |
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