发明名称 METHOD FOR SINTERING A SEMICONDUCTOR DEVICE USING A LOW-TEMPERATURE JOINING TECHNIQUE
摘要 The invention relates to a method for sintering a semiconductor component (5), which is suitable for power electronics and provided with contact areas, using a low-temperature joining technique. A sintering layer (6) that dissipates heat is arranged under the semiconductor component. The semiconductor component is provided with a further electrically and thermally conductive flat layer (4), to which bonding wires or bonding strips (1a, 1b) are bonded. In the method, the at least one further layer (4) is applied to the contact areas beyond insulating projecting edges (3), and sintering dies act on the applied at least one further layer (4) during sintering.
申请公布号 WO2011113414(A4) 申请公布日期 2012.05.03
申请号 WO2011DE00231 申请日期 2011.03.02
申请人 DANFOSS SILICON POWER GMBH;KOCK, MATHIAS 发明人 KOCK, MATHIAS
分类号 H01L21/48;H01L21/60 主分类号 H01L21/48
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