| 摘要 |
An imaging optical system (9) for a projection exposure system has at least one anamorphically imaging optical element (M1 to M6). This allows a complete illumination of an image field in a first direction with a large object-side numerical aperture in this direction, without the extent of the reticle to be imaged having to be enlarged and without a reduction in the throughput of the projection exposure system occurring. |
