| 摘要 |
<p>PURPOSE: A liquid treatment device and method are provided to prevent a chemical solution which is scattered when processing a substrate to be left in a process chamber by installing a cover of a cup circumference container at the lower side of the cup circumference container. CONSTITUTION: A nozzle(82a) supplies processing liquid to a substrate. A plurality of nozzle arms(82) supports the nozzle. A maintenance unit for keeping a wafer(W) with a horizontal state is installed within a process chamber(20). A rotating cup(40) of a ring shape is installed in around the maintenance unit. A cup circumference container(50) is arranged in around the rotating cup. An arm standby unit(80) is installed to be contiguous to the process chamber. A cleaning unit watches the cup circumference container. An exhaust unit for exhausting the mood within the process chamber is formed at the exterior of the cup circumference container.</p> |
