| 摘要 |
A SEMICONDUCTOR STRUCTURE IS DISCLOSED THAT ENHANCES QUALITY CONTROL INSPECTION OF A DEVICE. THE STRUCTURE INCLUDES A SUBSTRATE (14) HAVING AT LEAST ONE PLANAR FACE (16), A FIRST METAL LAYER (26) ON THE PLANAR FACE (16), AND COVERING SOME, BUT NOT ALL OF THE PLANAR FACE (16) IN A FIRST PREDETERMINED GEOMETRIC PATTERN, AND A SECOND METAL LAYER (27) ON THE PLANAR FACE (16), AND COVERING SOME, BUT NOT ALL OF THE PLANAR FACE (16) IN A SECOND GEOMETRIC PATTERN THAT IS DIFFERENT FROM THE FIRST GEOMETRIC PATTERN. A QUALITY CONTROL METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE IS ALSO DISCLOSED. THE METHOD INCLUDES THE STEPS OF PLACING A FIRST METAL LAYER (26) ON A SEMICONDUCTOR FACE (16) OF A DEVICE (10) IN A FIRST PREDETERMINED GEOMETRIC PATTERN, PLACING A SECOND METAL LAYER (27) ON THE SAME FACE OF THE DEVICE (10) AS THE FIRST LAYER (26) AND IN A SECOND PREDETERMINED GEOMETRIC PATTERN THAT IS DIFFERENT FROM THE FIRST GEOMETRIC PATTERN, AND THEN INSPECTING THE DEVICE (10) TO IDENTIFY THE PRESENCE OR ABSENCE OF ONE OR BOTH THE PATTERNS ON THE FACE. |
