发明名称 Hierarchical Nanopatterns by Nanoimprint Lithography
摘要 A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mold to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first pressure being able to reduce the elastic modulus of the article; and using a second mold to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.
申请公布号 KR101169426(B1) 申请公布日期 2012.07.27
申请号 KR20087011114 申请日期 2005.10.20
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址