PATTERN FORMING METHOD, METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM AND METHOD FOR MANUFACTURING LSI

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method and a method for manufacturing a magnetic recording medium capable of shortening the time required for forming a pattern.

SOLUTION: A resist is coated on a substrate on which a hard mask is deposited to form a resist pattern and the hard mask is etched using the resist pattern as a mask to form a hard mask pattern. A resist is coated on the hard mask and electron beam lithography is performed to form a second resist pattern. The hard mask is etched using the second resist pattern as a mask to form a second hard mask pattern.

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