发明名称 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an illumination system which is capable of forming an illumination mode in a manner which is not disclosed in the prior art. <P>SOLUTION: An illumination system comprises an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors form a first optical channel having a first refractive power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors form a second optical channel having a second refractive power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012160729(A) 申请公布日期 2012.08.23
申请号 JP20120013825 申请日期 2012.01.26
申请人 ASML NETHERLANDS BV 发明人 ANDREY SERGEEVICH TYCHKOV
分类号 H01L21/027 主分类号 H01L21/027
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