发明名称 PLASMA POTENTIAL MEASUREMENT METHOD, PLASMA POTENTIAL MEASUREMENT DEVICE AND PLASMA PROCESSING APPARATUS USING IT
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma potential measurement method capable of measuring the plasma voltage, in combination of analysis of ion species, by applying a mass spectrograph without relying upon a probe measuring instrument, and capable of carrying out both mass spectrometry and plasma voltage measurement at low cost, and to provide a device using it. <P>SOLUTION: In the plasma potential measurement method of plasma 2 to be measured in a vacuum chamber 1, a mass spectrograph 3 is placed in the vacuum chamber 1, mass spectrometry is carried out by applying a bias voltage between the plasma 2 and the mass spectrograph 3, suppressor voltage in the mass spectrograph 3 is varied under conditions of ion detection, and then the plasma voltage is calculated from the relationship of the suppressor voltage where the ion current is not detected and the bias voltage. A plasma potential measurement device is also provided. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012160281(A) 申请公布日期 2012.08.23
申请号 JP20110017735 申请日期 2011.01.31
申请人 NISSIN ELECTRIC CO LTD 发明人 TAKAHASHI MASATO
分类号 H05H1/00;C23C14/48;H01L21/304;H01L21/3065;H01L21/31;H05H1/48 主分类号 H05H1/00
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